Non-destructive characterization of vertical ZnO nanowire arrays by slow positron implantation spectroscopy, atomic force microscopy, and nuclear reaction analysis

Nanotechnology

Volumn 18, Issue 19, 2007, Pages

  Brauer, G ^a   Anwand, W ^a   Grambole, D ^a   Skorupa, W ^a   Hou, Y ^b   Andreev, A ^b   Teichert, C ^b   Tam, K H ^c   Djurisic A B ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b UNIVERSITY OF LEOBEN   (Austria)

^c UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; NONDESTRUCTIVE EXAMINATION; POSITRON ANNIHILATION SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

NANOWIRE ARRAYS; NUCLEAR REACTION ANALYSIS (NRA); SLOW POSITRON IMPLANTATION SPECTROSCOPY (SPIS);

NANOWIRES;

NANOROD; NANOWIRE; ZINC OXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; POSITRON EMISSION TOMOGRAPHY; PRIORITY JOURNAL; REACTION ANALYSIS; SCANNING ELECTRON MICROSCOPY; SENSITIVITY AND SPECIFICITY; SPECTROSCOPY; STRUCTURE ANALYSIS; THICKNESS; X RAY DIFFRACTION;

EID: 34249079756     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/19/195301     Document Type: Article

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