Thermal plasma synthesis of nanostructured silicon carbide films

Journal of Physics D: Applied Physics

Volumn 40, Issue 8, 2007, Pages 2354-2360

  Girshick, Steven L ^a   Hafiz, Jami ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SURFACE DIFFUSION; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION;

CRYSTALLINE PHASE; HYPERSONIC PLASMA PARTICLE DEPOSITION (HPPD); NANOPARTICLE IMPACT; THERMAL PLASMA CHEMICAL VAPOUR DEPOSITION (TPCVD);

NANOSTRUCTURED MATERIALS;

EID: 34249066811     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/8/S15     Document Type: Article

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