Growth mechanism of silicon-based functional nanoparticles fabricated by inductively coupled thermal plasmas

Journal of Physics D: Applied Physics

Volumn 40, Issue 8, 2007, Pages 2407-2419

  Shigeta, M ^a   Watanabe, T ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; NUCLEATION; PARTICLE SIZE ANALYSIS; SILICON; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CO-CONDENSATION MODEL; DISCRETIZATION; FUNCTIONAL NANOPARTICLES; NANOPARTICLE GROWTH;

NANOPARTICLES;

EID: 34249035025     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/8/S20     Document Type: Article

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