Nickel nanoparticle deposition at room temperature for memory applications

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 1994-1997

  Verrelli, E ^a   Tsoukalas, D ^a   Giannakopoulos, K ^b   Kouvatsos, D ^c   Normand, P ^c   Ioannou, D E ^d  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^b INSTITUTE OF MATERIALS SCIENCE   (Greece)

^c INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^d GEORGE MASON UNIVERSITY   (United States)

Author keywords

Metallic nanoparticles; Non volatile memory; PVD

Indexed keywords

HIGH-VACUUM TECHNIQUE; ROOM TEMPERATURE; TIME CHARGE STORAGE;

ELECTRIC CHARGE; ELECTRIC INSULATORS; NANOSTRUCTURES; NICKEL;

DEPOSITION;

EID: 34249024926     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.078     Document Type: Article

References (4)

1. Lee C.H., Meteer J., Narayanan V., and Kan E.C. J. Electronic Mater. 34 (2005) 1
2. Lee J.J., Harada Y., Pyun J.W., and Kwong D.L. Appl. Phys. Lett. 86 (2005) 103505
3. J. Dufourcq, P. Mur, M. J. Gordon, S. Minoret, R. Coppard, T. Baron, Materials Science and Engineering: C, in press (available in sciencedirect).
4. A. H. Kean and L. Allers, NSTI Nanotech Conference Proceedings, Boston, May 2006.