Fluorine effects on the dipole structures of the Al2 O3 thin films and characterization by spectroscopic ellipsometry

Applied Physics Letters

Volumn 90, Issue 17, 2007, Pages

  Lai, Chao Sung ^a   Fan, Kung Ming ^a   Peng, Hsing Kan ^a   Lin, Shian Jyh ^b   Lee, Chung Yuan ^b   Ai, Chi Fong ^c  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b NANYA TECHNOLOGY CORPORATION   (Taiwan)

^c INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL BONDS; DIPOLE MOMENT; FLUORINE; SILICON; SPECTROSCOPIC ELLIPSOMETRY;

DIPOLE STRUCTURES; FLUORINE EFFECTS; FTERMINATED BONDING;

THIN FILMS;

EID: 34248577655     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2730581     Document Type: Article

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