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In a typical experiment, ITO coated glass substrates were ultrasonically cleaned in sequential steps using acetone, methanol, and isopropanol. Poly(ethylenedioxythiophene)-polystyrene sulfonic acid (PEDOT-PSS, 2.5% in water) was spin coated, followed by baking at 120°C under nitrogen for 30 min to provide a 50 nm layer. Active materials were spin-coated from toluene (P8-OVS) and ethyl benzoate (P14-OVS) 20mg/mL to yield a thickness of 55 nm. The substrates were then loaded into a vacuum chamber and a TPB1 (40nm) layer was deposited followed by LiF (0.5nm, Ca (20nm, and Ag 200nm, TPBI as electron transport/hole blocking layer was important to achieve the high efficiencies
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In a typical experiment, ITO coated glass substrates were ultrasonically cleaned in sequential steps using acetone, methanol, and isopropanol. Poly(ethylenedioxythiophene)-polystyrene sulfonic acid (PEDOT-PSS, 2.5% in water) was spin coated, followed by baking at 120°C under nitrogen for 30 min to provide a 50 nm layer. Active materials were spin-coated from toluene (P8-OVS) and ethyl benzoate (P14-OVS) 20mg/mL to yield a thickness of 55 nm. The substrates were then loaded into a vacuum chamber and a TPB1 (40nm) layer was deposited followed by LiF (0.5nm), Ca (20nm). and Ag (200nm). TPBI as electron transport/hole blocking layer was important to achieve the high efficiencies.
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