Influence of interband transitions on electron-phonon coupling measurements in Ni films

Applied Optics

Volumn 46, Issue 11, 2007, Pages 2076-2083

  Hopkins, Patrick E ^a   Klopf, J Michael ^b   Norris, Pamela M ^a  

^a University of Virginia   (United States)

^b THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; FERMI LEVEL; FILM GROWTH; FILMS; MEASUREMENT THEORY; NICKEL; OPTOELECTRONIC DEVICES; PHONONS; TEMPERATURE CONTROL;

ELECTRON-PHONON COUPLING MEASUREMENTS; FEMTOSECOND THERMOREFLECTANCE; GLASS SUBSTRATES; INTERBAND TRANSITIONS;

MAGNETOELECTRONICS;

EID: 34248173959     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.46.002076     Document Type: Article

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