Electron work function decrease in SIMS analysis induced by neutral cesium deposition

International Journal of Mass Spectrometry

Volumn 264, Issue 1, 2007, Pages 70-83

  Philipp, P ^a   Wirtz, T ^a   Migeon, H N ^a   Scherrer, H ^b  

^a LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

CMS; Electron work function variation; Neutral Cs deposition; Secondary ion mass spectrometry; Useful yield

Indexed keywords

EID: 34248139770     PISSN: 13873806     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijms.2007.03.019     Document Type: Article

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