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Volumn 58, Issue 7, 2007, Pages 603-609

Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents

Author keywords

DRIE; SU 8 fabrication; Surface roughness; UTSP

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPILLARITY; FRICTION; INDUCTIVELY COUPLED PLASMA; SURFACE ROUGHNESS; SURFACE TENSION;

EID: 34247859193     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2006.07.005     Document Type: Article
Times cited : (27)

References (14)
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    • Lee, C.H.1    Jiang, K.C.2    Jin, P.3    Prewett, P.D.4
  • 5
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    • Winzeler, H.B.1    Belfort, G.2
  • 6
    • 34247867184 scopus 로고    scopus 로고
    • Shaw JM, Labianca N, et al. Photoresist composition and printed circuit boards and packages made therewith. US Patent number 488 2245, November 21, 1989.
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    • Robert Bosch Gmbh, patents 4855017 and 4784720 (USA), and 4241054C1 (Germany), 1994.
  • 9
    • 0033324414 scopus 로고    scopus 로고
    • The benefits of process parameter ramping during the plasma processing of high aspect ratio silicon structures
    • Hopkins J., et al. The benefits of process parameter ramping during the plasma processing of high aspect ratio silicon structures. Proceedings of the MRS fall meeting 1998 vol. 546 (1998) 63-68
    • (1998) Proceedings of the MRS fall meeting 1998 , vol.546 , pp. 63-68
    • Hopkins, J.1
  • 10
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    • Microfabrication of ultra-thick SU-8 photoresist for microengines
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    • Jin, P.1    Jiang, K.2    Sun, N.J.3
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    • Microchem, NANO™ SU-8, Negative tone photoresist formulations 2-25. http://www.microchem.com/products/pdf/SU8_2-25.pdf, Feb 2002.
  • 14
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    • Analysis of sidewall quality in through-wafer deep reactive-on etching
    • Pike W.T., Karl W.J., Kumar S., Vijendran S., and Semple T. Analysis of sidewall quality in through-wafer deep reactive-on etching. Microelectron Eng 73-74 (2004) 340-345
    • (2004) Microelectron Eng , vol.73-74 , pp. 340-345
    • Pike, W.T.1    Karl, W.J.2    Kumar, S.3    Vijendran, S.4    Semple, T.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.