DRIE based novel technique for AFM probes fabrication

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1132-1135

  Villanueva, G ^a   Plaza, J A ^a   Sanchez A ^a   Zinoviev, K ^a   Perez Murano F ^a   Bausells, J ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

Author keywords

AFM probes; DRIE

Indexed keywords

ATOMIC FORCE MICROSCOPY; MACHINING; OPTIMIZATION; ROCKETS; SHAFTS (MACHINE COMPONENTS); SILICON WAFERS;

CANTILEVERS; DEEP REACTIVE ION ETCHING (DRIE) EQUIPMENT;

REACTIVE ION ETCHING;

EID: 34247632168     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.078     Document Type: Article

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