Microanalysis of Pd and V-doped TiO2 thin films prepared by sputtering

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6347-6349

  Kaczmarek, D ^a   Domaradzki, J ^a   Borkowska, A ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Oxide semiconductor; Sputtering; Structural properties; Titanium oxide

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; MICROANALYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; TITANIUM OXIDES;

NANOCRYSTALLINITY; OXIDE SEMICONDUCTOR; THIN FILM DEPOSITION;

THIN FILMS;

EID: 34247507611     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.083     Document Type: Article

References (11)

1. Diebold U. Surf. Sci. Rep. 48 (2003) 53
2. Weng W., Ma M., Du P., Zhao G., Shen G., Wang J., and Han G. Surf. Coat. Technol. 198 (2005) 340
3. Kudrawiec R., Podhorodecki A., Mirowska N., Misiewicz J., Molchan I.S., Gaponenko N.V., Lutich A.A., and Gaponenko S.V. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 105 (2003) 53
4. Zhao G., Kozuka H., Lin H., and Yoko T. Thin Solid Films 339 (1999) 123
5. Podhorodecki A., Kudrawiec R., Misiewicz J., Gaponenko N.V., and Tsyrkunow D. Opt. Mater. 28 (2006) 685
6. Domaradzki J. Thin Solid Films 497 (2006) 243
7. Klug H., and Alexander L. X-ray Diffraction Procedures (1974), John Wiley & Sons, New York 635
8. Powder Diffraction File, Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967, Card 5-681.
9. Powder Diffraction File, Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967, Card 6-515.
10. Powder Diffraction File, Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967, Card 21-1276.
11. Powder Diffraction File, Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967, Card 38-44.