Dependence of target-substrate distance on crystallographic and optical properties of WO3 films prepared by reactive radio frequency magnetron sputtering

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6567-6571

  Takahashi, T ^a   Prabakar, K ^a   Hossain, M F ^a   Kubota, Y ^b   Fujishima, A ^c  

^a UNIVERSITY OF TOYAMA   (Japan)

^b YOKOHAMA CITY UNIVERSITY   (Japan)

^c KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Methanol decomposition; Reactive magnetron sputtering; WO3 thin films

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLITE SIZES; METHANOL DECOMPOSITION; PHOTOCATALYTIC OXIDATION; REACTIVE MAGNETRON SPUTTERING; REACTIVE RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 34247478479     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.140     Document Type: Article

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