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Volumn 515, Issue 15 SPEC. ISS., 2007, Pages 6045-6050

Properties of indium tin oxide films deposited using High Target Utilisation Sputtering

Author keywords

Indium tin oxide; Polyimide; Sputtering; TCO

Indexed keywords

DEPOSITION; FLOW RATE; HEAT TREATMENT; HEATING; INDIUM COMPOUNDS; POLYIMIDES; SOLAR CELLS; SPUTTERING; THERMODYNAMIC STABILITY; VACUUM;

EID: 34247373763     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.12.063     Document Type: Article
Times cited : (30)

References (15)
  • 4
    • 34247334370 scopus 로고    scopus 로고
    • M.J. Thwaites, High Density Plasmas, USA Patent No. 646387, (2002).
  • 5
    • 34247351778 scopus 로고    scopus 로고
    • Upilex-S Data Sheet, Ube Industries Limited, (2000).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.