Minimum enclosing and maximum excluding machine for pattern description and discrimination

Proceedings - International Conference on Pattern Recognition

Volumn 3, Issue , 2006, Pages 129-132

  Liu, Yi ^a   Zheng, Yuan F ^a  

^a Ohio State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA REDUCTION; IMAGE PROCESSING; SUPPORT VECTOR MACHINES;

MAXIMUM EXCLUDING MACHINES; MINIMUM ENCLOSING; PATTERN DESCRIPTION; PERFORMANCE COMPARISONS;

PATTERN RECOGNITION;

EID: 34147123690     PISSN: 10514651     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICPR.2006.799     Document Type: Conference Paper

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