Sequential quenching of randomly deposited ellipsoids: Anisotropy and spatial patterns

Journal of Colloid and Interface Science

Volumn 309, Issue 2, 2007, Pages 384-391

  Danwanichakul, Panu ^a   Glandt, Eduardo D ^b  

^a THAMMASAT UNIVERSITY   (Thailand)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

Clustering; Ellipsoid; Irreversible adsorption; Monte Carlo simulation; Sequential deposition

Indexed keywords

ANISOTROPY; ASPECT RATIO; DEPOSITION; MOLECULAR ORIENTATION; QUENCHING; THERMAL EFFECTS;

ELLIPSOIDS; IRREVERSIBLE ADSORPTION; POINT ENERGY ADDITIVITY; SEQUENTIAL DEPOSITION;

SURFACE ANALYSIS;

PHOSMET;

ANISOTROPY; ARTICLE; MATHEMATICAL COMPUTING; MONTE CARLO METHOD; PRIORITY JOURNAL; TEMPERATURE SENSITIVITY;

ANISOTROPY; MATHEMATICS; MODELS, THEORETICAL; MONTE CARLO METHOD; PARTICLE SIZE; SURFACE PROPERTIES; TEMPERATURE;

EID: 34147096499     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2006.06.038     Document Type: Article

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