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Surface and Coatings Technology

Volumn 201, Issue 16-17, 2007, Pages 7013-7017

Magnetron sputtering of NASICON (Na3Zr2Si2PO12) thin films Part I: Limitations of the classical methods

(3) Horwat, D a Pierson, J F a Billard, A b

a INSTITUT JEAN LAMOUR (France)

b UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD (France)

Author keywords

Chemical heterogeneity; Magnetron sputtering; Sodium superionic conductor

Indexed keywords

CHEMICAL STABILITY; IONIC CONDUCTIVITY; SODIUM COMPOUNDS; SPUTTER DEPOSITION; STOICHIOMETRY; STRUCTURE (COMPOSITION); THIN FILMS;

CHEMICAL HETEROGENEITY; SODIUM SUPERIONIC CONDUCTIVITY;

MAGNETRON SPUTTERING;

CHEMICAL STABILITY; IONIC CONDUCTIVITY; MAGNETRON SPUTTERING; SODIUM COMPOUNDS; SPUTTER DEPOSITION; STOICHIOMETRY; STRUCTURE (COMPOSITION); THIN FILMS;

EID: 34047257524 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.01.007 Document Type: Article

Times cited : (8)

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