Structural evolution and electrochemical performance of sputter-deposited Cu6 Sn5 thin-film anodes

Journal of the Electrochemical Society

Volumn 154, Issue 5, 2007, Pages

  Chiu, K F ^a,d   Lin, K M ^a   Lin, H C ^b   Chen, W Y ^a   Shieh, D T ^c,d  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^d ELECTROCHEMICAL SOCIETY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURE; FILM DEPOSITION; STRUCTURAL EVOLUTION; X-RAY DIFFRACTION SPECTRA;

COPPER ALLOYS; CRYSTAL STRUCTURE; ELECTROCHEMICAL ELECTRODES; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION;

ANODES;

EID: 34047186953     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2712830     Document Type: Article

References (15)

1. K. D. Kepler, J. T. Vaughey, and M. M. Thackeray, Electrochem. Solid-State Lett., 2, 307 (1999).
2. G. X. Wang, L. Sun, D. H. Bradhurt, S. X. Dou, and H. K. Liu, J. Alloys Compd., 299, L12 (2000).
3. Y. Xia, T. Sakai, T. Fujieda, M. Wada, and H. Yoshinaga, J. Electrochem. Soc., 148, 471 (2001).
4. S. D. Beattie and J. R. Dahn, J. Electrochem. Soc., 150, 894 (2003).
5. D. Larcher, L. Y. Beaulieu, D. D. MacNeil, and J. R. Dahn, J. Electrochem. Soc., 147, 1658 (2000).
6. G. M. Ehrlich, C. Durand, X. Chen, T. A. Hugener, F. Spiess, and S. L. Suib, J. Electrochem. Soc., 147, 886 (2000).
7. H. Mukaido, T. Sumi, T. Yokoshima, T. Momma, and T. Osaka, Electrochem. Solid-State Lett., 6, 218 (2003).
8. Y. L. Kim, H. Y. Lee, S. W. Jang, S. J. Lee, H. K. Baik, Y. S. Yoon, Y. S. Park, and S. M. Lee, Solid State Ionics, 160, 235 (2003).
9. O. Mao, R. L. Turner, I. A. Courtney, B. D. Fredericksen, M. I. Buckett, L. J. Krause, and J. R. Dahn, Electrochem. Solid-State Lett., 2, 3 (1999).
10. O. Mao and J. R. Dahn, J. Electrochem. Soc., 146, 414 (1999).
11. K.-F. Chiu, H. C. Lin, K. M. Lin, T. Y. Lin, and D. T. Shieh, J. Electrochem. Soc., 153, A920 (2006).
12. K.-H. Muller, Phys. Rev. B, 35, 7906 (1987).
13. N. Tamura, M. Fujimoto, M. Kamino, and S. Fujitani, Electrochim. Acta, 49, 1949 (2004).
14. N. Tamura, Y. Kato, A. Mikami, M. Kamino, S. Matsuta, and S. Fujitani, J. Electrochem. Soc., 153, A1626 (2006).
15. K.-F. Chiu, H. C. Lin, K. M. Lin, T. Y. Lin, and D. T. Shieh, J. Electrochem. Soc., 153, A1038 (2006).