Micromachined 22 GHz PI filter by CMOS compatible ICP deep trench technology

Electronics Letters

Volumn 43, Issue 7, 2007, Pages 398-399

  Wang, T ^a   Lin, Y S ^b   Lu, S S ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL CHI NAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP TRENCH TECHNOLOGY; POWER GAIN; QUALITY FACTOR;

BANDWIDTH; CMOS INTEGRATED CIRCUITS; ELECTRIC INDUCTORS; ETCHING; INDUCTIVELY COUPLED PLASMA; MICROMACHINING;

BANDPASS FILTERS;

EID: 34047120832     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20070437     Document Type: Article

References (6)

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2. Lin, H.H., Tung, W.S., Cheng, J.C., and Chiang, Y.C.: ' Design of second order band-pass filter with inductive π-network coupling ', IEICE Trans. Commun., 2005, E88-B, (6), 2629-2631 0916-8516
3. Tung, W.S., Chiu, H.C., and Chiang, Y.C.: ' Implementation of millimetre-wave bandpass filter with MMIC technology ', Electron. Lett., 2005, 41, (13), p. 744-745 10.1049/el:20051179 0013-5194
4. Nilsson, J.W., and Riedel, S.A.: ' Electric circuits ', (Prentice-Hall, New Jersey, 2002)), p. 433-434
5. Hung, J.S.G., and Lancaster, M.J.: ' Microstrip filters for RF/microwave applications ', (Wiley-Interscience, 2001)
6. Ng, K.T., Rejaei, B., and Burghartz, J.N.: ' Substrate effects in monolithic RF transformers on silicon ', IEEE Trans. Microw. Theory Tech., 2002, 50, (1), p. 377-383 10.1109/22.981289 0018-9480