Ion implantation induced structural changes in reactively sputtered Cr-N layers on Si substrates

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 782-785

  Novakovic M ^a   Popovic M ^a   Perusko D ^a   Milinovic V ^b   Radovic I ^a   Bibic N ^a   Mitric M ^a   Milosavljevic M ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

CrN hard coatings; Ion beam modification; Ion implantation; TEM analysis

Indexed keywords

CHROMIUM; DEPOSITION; ELECTRIC CONDUCTIVITY; ION IMPLANTATION; PARTIAL PRESSURE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CRN HARD COATINGS; ION BEAM MODIFICATION; MICRO-STRUCTURAL CHANGES; STRUCTURAL CHANGES;

SILICON;

EID: 33947714857     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.01.112     Document Type: Article

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