Comparative actions of NiO and TiO 2 catalysts on the destruction of phenol and its derivatives in a dielectric barrier discharge

Plasma Chemistry and Plasma Processing

Volumn 27, Issue 2, 2007, Pages 177-187

  Bubnov, A G ^a   Burova, E Yu ^a   Grinevich, V I ^a   Rybkin, V V ^a   Kim, J K ^b   Choi, H S ^c  

^a IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

^b Konyang University   (South Korea)

^c Chungnam National University   (South Korea)

Author keywords

NiO and TiO 2 catalyst; Oxygen dielectric barrier discharge; Phenol decomposition

Indexed keywords

DIELECTRIC BARRIER DISCHARGES; PLASMA ZONES; PYROCATECHOLS;

DECOMPOSITION; ELECTRIC DISCHARGES; NICKEL OXIDE; PHENOLS; PLASMA APPLICATIONS; SOLUTIONS; TITANIUM DIOXIDE;

CATALYSTS;

EID: 33947709900     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-007-9052-8     Document Type: Article

References (14)

1. Janca J, Kuzmin S, Maximov A, Titova J, Czernichowski A (1999) Plasma Chem Plasma Proc 19:53
2. Brisset JL, Levievre J, Amouroux J (1990) Rev Phys Appl 25:535
3. Tezuka M, Iwasaki M (1998) Thin Solid Film 316:123
4. Hoeben WFLM, van Veldhuizen EM, Rutgers WR, Kroesen GMW (1999) J Phys D 32:133
5. Sunka P, Babicky V, Clupek M, Lukes P, Simek M, Schmidt J, Cernak M (1999) Plasma Sources Sci Technol 8:258
6. Grymonpre DR, Sharma AK, Finney WC, Locke BR (2001) Chem Eng J 82:189
7. Bubnov AG, Burova EYu, Grinevich VI, Rybkin VV, Kim J-K, Choi H-S (2006) Plasma Chem Plasma Proc 26:19
8. Yan JH, Du ChM, Li XD, Cheron BG, Ni MJ, Cen KF (2006) Plasma Chem Plasma Proc 26:31
9. Fox MA, Dulay MT (1993) Chem Rev 93:341
10. Pohloudek-Fabini R, Beyrich Th (1975) Organische Analyse unter besonderer Berucksichtigung von Arzneistoffen. Akademishe erlagsgesellschaft Geest & Portig, Leipzig
11. Hillebrand WF, Lundell GEF (1953) Applied inorganic analysis, 2nd edn. John Wiley & Sons, Inc., New-York
12. Briggs D, Seach MP (1983) Practical surface analysis by auger and X-ray photoelectron spectroscopy. John Wiley & Sons, Chichester
13. Hass G, Thun RE (1964) Physics of thin films. Advances in research and development, vol II. Academic Press, New York
14. Bugaenko LT, Kuzmin MG, Polak LS (1993) High energy chemistry. Ellis Horwood, New York