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Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 60-63
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Nano-cluster formation in Ge+Sn implanted SiO2 layers
b
Integral RPC
(Belarus)
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Author keywords
GeSn nano clusters; Ion implantation; TEM
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Indexed keywords
CATHODOLUMINESCENCE;
GERMANIUM;
ION IMPLANTATION;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEGREGATION (METALLOGRAPHY);
SILICA;
TRANSMISSION ELECTRON MICROSCOPY;
GESN NANO-CLUSTERS;
NANO-CLUSTER FORMATION;
TRANSMISSION ELECTRON DIFFRACTION (TED);
NANOCLUSTERS;
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EID: 33947676262
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2006.12.116 Document Type: Article |
Times cited : (1)
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References (15)
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