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Volumn 40, Issue 2, 2007, Pages 395-400
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TEM characterization of extended defects induced in Si wafers by H-plasma treatment
a a b b c d |
Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTATIONAL GEOMETRY;
PLASMA THEORY;
POINT DEFECTS;
SURFACE ROUGHNESS;
TRANSMISSION ELECTRON MICROSCOPY;
DIFFRACTION CONTRAST ANALYSIS;
GEOMETRICAL PHASE METHOD;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM);
SILICON WAFERS;
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EID: 33947659969
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/40/2/016 Document Type: Article |
Times cited : (12)
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References (24)
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