메뉴 건너뛰기




Volumn 40, Issue 2, 2007, Pages 395-400

TEM characterization of extended defects induced in Si wafers by H-plasma treatment

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; PLASMA THEORY; POINT DEFECTS; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33947659969     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/2/016     Document Type: Article
Times cited : (12)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.