Ultraviolet laser beam and confocal microscopy - A system for rapid patterned photolysis

IEEE Circuits and Devices Magazine

Volumn 22, Issue 6, 2006, Pages 66-74

  Kojima, H ^a   Simburger, E ^b   Boucsein, C ^c   Maruo, T ^d   Tsukada, M ^a   Okabe, S ^d   Aertsen, Ad ^c  

^a TAMAGAWA UNIVERSITY   (Japan)

^b CARL ZEISS SMT AG   (Germany)

^c UNIVERSITY OF FREIBURG   (Germany)

^d TOKYO MEDICAL AND DENTAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONFOCAL MICROSCOPY; LASER BEAMS; NEURONS; PHOTOLYSIS; PHOTONS; ULTRAVIOLET RADIATION;

MULTIPHOTON EXCITATION MICROSCOPY; TWO-PHOTON CONFOCAL LASER MICROSCOPY; ULTRAVIOLET LASER BEAM;

NEUROLOGY;

EID: 33947417289     PISSN: 87553996     EISSN: None     Source Type: Journal    
DOI: 10.1109/MCD.2006.307279     Document Type: Article

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