In-situ XAFS characterization for nitriding process of silica supported Nb catalysts under N2-H2 gas

AIP Conference Proceedings

Volumn 882, Issue , 2007, Pages 639-641

  Ichikuni, Nobuyuki ^a   Matsumoto, Hiroari ^a   Haneishi, Hidenori ^a   Bando, Kyoko K ^b   Shimazu, Shogo ^a  

^a CHIBA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Catalyst; In situ XAFS; Nb nitride

Indexed keywords

EID: 33947413466     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2644616     Document Type: Conference Paper

References (5)

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4. N. Ichikuni, H. Hachiya, K. K. Bando, S. Shimazu and T. Uematsu, Physica Scripta T115, 807 (2005).
5. K. K. Bando, T. Saito, K. Sato, T. Tanaka, F. Dumeignil, M. Imamura, N. Matsubayashi and H. Shimada, J. Synchrotron Rad. 8, 581 (2001).