Thin films of langasite (La3Ga5SiO14) prepared by pulsed laser deposition

Journal of Optoelectronics and Advanced Materials

Volumn 4, Issue 3, 2002, Pages 813-818

  Popescu, M ^a   Sava, F ^a   Georgescu, S ^b   Gheorghe, L ^b   Mihailescu, I N ^b   Cristescu, R ^b   Socol, G ^b   Bradaczek, H ^c  

^a Institute for Materials Physics   (Romania)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c EFG International   (Germany)

Author keywords

Amorphous; Crystallization; Langasite; Pulsed laser deposition; X ray diffraction

Indexed keywords

AMORPHOUS SILICON; FILM PREPARATION; GALLIUM COMPOUNDS; PULSED LASER DEPOSITION; PULSED LASERS; SILICON COMPOUNDS; SILICON WAFERS; THIN FILMS;

LANGASITE CRYSTALS; LANGASITES; POLYCRYSTALLINE; SILICON SUBSTRATES;

LANTHANUM COMPOUNDS;

EID: 33947400134     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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