Molecular dynamics - Monte Carlo hybrid simulation of thin film growth and void formation in electrodeposition process

Molecular Simulation

Volumn 33, Issue 1-2, 2007, Pages 133-138

  Hiwatari, Yasuaki ^a   Kaneko, Yutaka ^b   Mikami, Takashi ^b   Ohara, Katsuhiko ^c   Asa, Fujio ^c  

^a KANAZAWA UNIVERSITY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c Central Research and Development Laboratory   (Japan)

Author keywords

Electrodeposition; Molecular dynamics; Monte Carlo; Void formation

Indexed keywords

ADATOMS; COMPUTER SIMULATION; CRYSTAL GROWTH; ELECTRODEPOSITION; FILM GROWTH; INTERFACES (MATERIALS); MOLECULAR DYNAMICS; MONTE CARLO METHODS; SURFACE DIFFUSION; SURFACE STRUCTURE;

DESORPTION REACTIONS; V-SHAPED GROOVES; VOID FORMATION;

THIN FILMS;

EID: 33947382221     PISSN: 08927022     EISSN: 10290435     Source Type: Journal    
DOI: 10.1080/08927020601052930     Document Type: Conference Paper

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