Using E-beam and X-ray lithography techniques to fabricate zone plates for hard X-ray

AIP Conference Proceedings

Volumn 879, Issue , 2007, Pages 1466-1469

  Lo, T N ^a   Chen, Y T ^a,c   Liu, C J ^a   Chang, W D ^a,b   Lai, T Y ^a,b   Wu, H J ^a,b   Lin, I K ^a   Su, C I ^a,b   Shew, B Y ^d   Je, J H ^e   Margaritondo, G ^f   Hwu, Y ^a,b  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^c TATUNG UNIVERSITY   (Taiwan)

^d NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^e Pohang University of Science and Technology (POSTECH)   (South Korea)

^f EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33947366300     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2436341     Document Type: Conference Paper

References (2)

1. D. Attwood, Soft X-Rays and Externe Ultraviolet Radiation: Principles and Applications, Chapter 9, Cambridge University Press (1999).
2. C. David, R. Medenwaldt, J. Thieme, P. Guttmann, D. Rudolph and G. Schmahl, J. Optics (Paris) 23, 255-258 (1992).