Electrical analysis of positive corona discharge in air and N2, O2, and C O2 mixtures

Journal of Applied Physics

Volumn 101, Issue 5, 2007, Pages

  Dubois, D ^a   Merbahi, N ^a   Eichwald, O ^a   Yousfi, M ^a   Benhenni, M ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CURRENT VOLTAGE CHARACTERISTICS; DISTRIBUTION FUNCTIONS; ELECTRIC PROPERTIES; ELECTRON ENERGY LEVELS; ELECTRONEGATIVITY; GAS MIXTURES; NITROGEN;

STREAMER DEVELOPMENT; STREAMER VELOCITY;

ELECTRIC DISCHARGES;

EID: 33947329342     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2464191     Document Type: Article

References (41)

1. Non Thermal Plasma Techniques for Pollution Control, edited by, B. M. Penetrante, and, S. E. Schultheis, (Springer, New York, 1992), Pts. and.
2. U. Kogelschatz, B. Eliasson and W. Egli, Invited paper ICPIG, Toulouse, France, 1997; [U. Kogelschatz, B. Eliasson and W. Egli, J. Phys. (Paris), Colloq. C4, 47 (1997)].
3. U. Kogelschatz, B. Eliasson and W. Egli, Invited paper ICPIG, Toulouse, France, 1997; [U. Kogelschatz, B. Eliasson and W. Egli, J. Phys. (Paris), Colloq. C4, 47 (1997)].
4. S. Masuda and H. Nakao, IEEE Trans. Ind. Appl. 0093-9994 10.1109/28.54266 26, 374 (1990); M. Horváth and E. Kiss, J. Electrost. 63, 993 (2005).
5. S. Masuda and H. Nakao, IEEE Trans. Ind. Appl. 0093-9994 10.1109/28.54266 26, 374 (1990); M. Horváth and E. Kiss, J. Electrost. 63, 993 (2005).
6. x, SAE Paper No. 982508, 1998, http://www.llnl.gov/tid/lof/documents/pdf/236980. pdf).
7. Yu. S. Akishev, M. Grushin, I. Kochetov, V. Karal'nik, A. Napartovich, and N. Trushkin, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/2/ S03 14, S18 (2005); Y. An, R. Aliaga-Rossel, P. Choi, and J. P. Gilles, Rev. Sci. Instrum. 0034-6748 10.1063/1.1994984 76, 085105 (2005); Y. Arao, T. Fujii, and M. Yatsuzuka, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845335 33, 312 (2005); R. Ono and T. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.321 43, 321 (2004); E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 0022-3727 10.1088/0022-3727/35/17/313 35, 2169 (2002); O. Goossens, T. Callebaut, Yu. Akichev, A. Napartovich, N. Trushkin and C. Leys, IEEE Trans. Plasma Sci. 30, 176 (2002).
8. Yu. S. Akishev, M. Grushin, I. Kochetov, V. Karal'nik, A. Napartovich, and N. Trushkin, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/2/ S03 14, S18 (2005); Y. An, R. Aliaga-Rossel, P. Choi, and J. P. Gilles, Rev. Sci. Instrum. 0034-6748 10.1063/1.1994984 76, 085105 (2005); Y. Arao, T. Fujii, and M. Yatsuzuka, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845335 33, 312 (2005); R. Ono and T. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.321 43, 321 (2004); E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 0022-3727 10.1088/0022-3727/35/17/313 35, 2169 (2002); O. Goossens, T. Callebaut, Yu. Akichev, A. Napartovich, N. Trushkin and C. Leys, IEEE Trans. Plasma Sci. 30, 176 (2002).
9. Yu. S. Akishev, M. Grushin, I. Kochetov, V. Karal'nik, A. Napartovich, and N. Trushkin, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/2/ S03 14, S18 (2005); Y. An, R. Aliaga-Rossel, P. Choi, and J. P. Gilles, Rev. Sci. Instrum. 0034-6748 10.1063/1.1994984 76, 085105 (2005); Y. Arao, T. Fujii, and M. Yatsuzuka, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845335 33, 312 (2005); R. Ono and T. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.321 43, 321 (2004); E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 0022-3727 10.1088/0022-3727/35/17/313 35, 2169 (2002); O. Goossens, T. Callebaut, Yu. Akichev, A. Napartovich, N. Trushkin and C. Leys, IEEE Trans. Plasma Sci. 30, 176 (2002).
10. Yu. S. Akishev, M. Grushin, I. Kochetov, V. Karal'nik, A. Napartovich, and N. Trushkin, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/2/ S03 14, S18 (2005); Y. An, R. Aliaga-Rossel, P. Choi, and J. P. Gilles, Rev. Sci. Instrum. 0034-6748 10.1063/1.1994984 76, 085105 (2005); Y. Arao, T. Fujii, and M. Yatsuzuka, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845335 33, 312 (2005); R. Ono and T. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.321 43, 321 (2004); E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 0022-3727 10.1088/0022-3727/35/17/313 35, 2169 (2002); O. Goossens, T. Callebaut, Yu. Akichev, A. Napartovich, N. Trushkin and C. Leys, IEEE Trans. Plasma Sci. 30, 176 (2002).
11. Yu. S. Akishev, M. Grushin, I. Kochetov, V. Karal'nik, A. Napartovich, and N. Trushkin, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/2/ S03 14, S18 (2005); Y. An, R. Aliaga-Rossel, P. Choi, and J. P. Gilles, Rev. Sci. Instrum. 0034-6748 10.1063/1.1994984 76, 085105 (2005); Y. Arao, T. Fujii, and M. Yatsuzuka, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845335 33, 312 (2005); R. Ono and T. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.321 43, 321 (2004); E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 0022-3727 10.1088/0022-3727/35/17/313 35, 2169 (2002); O. Goossens, T. Callebaut, Yu. Akichev, A. Napartovich, N. Trushkin and C. Leys, IEEE Trans. Plasma Sci. 30, 176 (2002).
12. Yu. S. Akishev, M. Grushin, I. Kochetov, V. Karal'nik, A. Napartovich, and N. Trushkin, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/14/2/ S03 14, S18 (2005); Y. An, R. Aliaga-Rossel, P. Choi, and J. P. Gilles, Rev. Sci. Instrum. 0034-6748 10.1063/1.1994984 76, 085105 (2005); Y. Arao, T. Fujii, and M. Yatsuzuka, IEEE Trans. Plasma Sci. 0093-3813 10.1109/TPS.2005.845335 33, 312 (2005); R. Ono and T. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.321 43, 321 (2004); E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 0022-3727 10.1088/0022-3727/35/17/313 35, 2169 (2002); O. Goossens, T. Callebaut, Yu. Akichev, A. Napartovich, N. Trushkin and C. Leys, IEEE Trans. Plasma Sci. 30, 176 (2002).
13. D. Nelson, M. Benhenni, M. Yousfi, and O. Eichwald, J. Phys. D 34, 3247 (2001).
14. M. Yousfi and M. D. Benabdessadok, J. Appl. Phys. 80, 6619 (1996).
15. O. Eichwald, M. Yousfi, A. Hennad, and M. D. Benabdessadok, J. Appl. Phys. 82, 4781 (1997).
16. O. Eichwald, N. A. Guntoro, M. Yousfi, and M. Benhenni, J. Phys. D 35, 439 (2002).
17. E. Marode, J. Appl. Phys. 46, 2005 (1975).
18. G. Lan, C. Vernon, T. Rajeev, and S. Viktor, IEEE Annual Report-Conference on Electrical Insulation and Dielectric Phenomena, Minneapolis, 19-22 October, 1997, Vol. 2, pp. 587-90.
19. E. Nasser, Fundamentals of Gaseous Ionization and Plasma Electronics (Wiley Interscience, New York, 1971).
20. L. B. Loeb, Electrical Coronas (University of California, Berkeley, CA, 1991).
21. D. Bessìre, J. Paillol, A. Gibert, L. Ṕcastaing, and T. Reess, 15th International Conference on Gas Discharge and Their Applications, Toulouse, France, edited by, M. C. Bordage, A. Gleizes, and, J. J. Gonzalez, 1998, Vol. 1, 497-500.
22. F. Nicolas, J. F. Loiseau, A. E. Ercilbengoa, and R. Peyrous, J. Phys. D 31, 3108 (1998).
23. M. Goldman and A. Goldman, Corona Discharges, Gaseous Electronics Vol. 1 (Academic, New York, 1978).
24. M. Menes and L. H. Fisher, Phys. Rev. 94, 1 (1954).
25. S. Lachaud and J. F. Loiseau, Eur. Phys. J.: Appl. Phys. 24, 67 (2003).
26. R. S. Sigmond, Electrical Breakdown of Gases (Wiley Intersciences, New York, 1978).
27. T. Suzuki, J. Appl. Phys. 42, 3766 (1971).
28. R. Ono and T. Oda, J. Phys. D 36, 1952 (2003).
29. P. Tardiveau, E. Marode, and A. Agneray, J. Phys. D 35, 2823 (2002).
30. E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 36, 2692 (2003).
31. E. M. van Veldhuizen and W. R. Rutgers, J. Phys. D 35, 2169 (2002).
32. K. Yan, T. Yamamoto, S. Kanazawa, T. Ohkubo, Y. Nomoto, and J. S. Chang, J. Electrost. 46, 207 (1999).
33. F. Granǵ, N. Soulem, J. F. Loiseau, and N. Spyrou, J. Phys. D 28, 1619 (1995).
34. Electron-molecule Interactions and Their Applications, edited by, L. G. Christophorou, (Academic, New York, 1984).
35. J. M. Meek, Phys. Rev. 57, 722 (1940).
36. M. Yousfi, N. Azzi, I. Gallimberti, and S. Stnagherlin, Collection Data base No. 1, Internal report, Toulouse Padova, 1988, www.laplace.univ-tlse.fr.
37. W. L. Nighan, Phys. Rev. A 1050-2947 10.1103/PhysRevA.2.1989 2, 1989 (1970);
38. Y. Itikawa, J. Phys. Chem. Ref. Data 0047-2689 10.1063/1.555762 15, 985 (1986);
39. Y. Itikawa, J. Phys. Chem. Ref. Data 0047-2689 10.1063/1.555841 18, 23 (1986);
40. Y. Itikawa, J. Phys. Chem. Ref. Data 0047-2689 10.1063/1.1481879 31, 749 (2002);
41. Y. Itikawa, J. Phys. Chem. Ref. Data 35, 31 (2006).