Optical properties of amorphous hydrogenated silicon nitride thin films

Optical Engineering

Volumn 45, Issue 12, 2006, Pages

  Pérez, Arllene Mariana ^a   Santiago, César ^b   Renero, Francisco ^c   Zuñiga, Carlos ^c  

^a UNIVERSIDAD POPULAR AUTÓNOMA DEL ESTADO DE PUEBLA   (Mexico)

^b UNIVERSIDAD POLITÉCNICA DE TULANCINGO   (Mexico)

^c INSTITUTO NACIONAL DE ASTROFÍSICA   (Mexico)

Author keywords

Amorphous silicon nitride; Optical properties; PECVD; Thin films; Transmission spectra

Indexed keywords

AMORPHOUS SILICON; OPACITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS;

CAUCHY MODEL; SELLMEIER MODEL; TRANSMISSION SPECTRA;

SILICON NITRIDE;

EID: 33947267672     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2402493     Document Type: Article

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