Applications of polishing technology using polymer particles to silicon wafers and quartz crystal wafers

Key Engineering Materials

Volumn 339, Issue , 2007, Pages 263-268

  Lu, Y S ^a   Tani, Y ^a   Soutome, K ^b   Kamimur, Y ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b KYOCERA CORPORATION   (Japan)

Author keywords

Edge profile; Polishing; Polymer particle; Roll off

Indexed keywords

CHEMICAL POLISHING; CRYSTAL STRUCTURE; DETERIORATION; PROBLEM SOLVING; QUARTZ; SILICON WAFERS;

EDGE PROFILE; POLYMER PARTICLES; QUARTZ CRYSTAL SQUARE WAFERS;

POLYMERS;

EID: 33947205712     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-430-8.263     Document Type: Conference Paper

References (2)

1. Y.Lu.Y.Tani and K. Kawata: Annals of the CIRP, Vol.51 (2002) No.1.
2. Y.Lu, Y. Tani and Y. Kamimura: Proceedings of JSPE Semestrial Conference (Autumn). Vol.395-396 (2004), (in Japanese).