Processing and properties of unidirectional SiO2f/SiO2 composites

Ceramics International

Volumn 33, Issue 4, 2007, Pages 669-673

  Xu, Chang Ming ^a,b   Wang, S W ^a   Huang, X X ^a   Guo, J K ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

C. Dielectric properties; C. Mechanical properties; Microstructure; SiO2f SiO2 composites

Indexed keywords

DIELECTRIC PROPERTIES; HOT PRESSING; MECHANICAL PROPERTIES; MICROSTRUCTURE; SILICA; SINTERING;

DEGRADING PROPERTIES; PRESSURELESS SINTERING; PYROLYTIC CARBON (PYC); SINTERING TEMPERATURE;

COMPOSITE MATERIALS;

EID: 33947176139     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2005.12.017     Document Type: Article

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