Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 4, 2006, Pages

  Subramanian, Shyamala ^a   Catchmark, Jeffrey M ^b  

^a The Pennsylvania State University   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

Electron beam lithography; Lift off; Molecular rulers; Nanoscale lithography; Sacrificial host; Self assembly

Indexed keywords

LIFT OFF; METAL LAYERS; MOLECULAR RULER NANOLITHOGRAPHY; SACRIFICIAL HOSTS;

ELECTRON BEAM LITHOGRAPHY; ELECTRONIC STRUCTURE; MICROFABRICATION; MULTILAYERS; SELF ASSEMBLED MONOLAYERS;

NANOLITHOGRAPHY;

LITHOGRAPHY;

EID: 33947171200     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2401140     Document Type: Article

References (8)

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3. A. Hatzor and P. S. Weiss., "Molecular rulers for scaling down," Science 291, 1019-1020 (2001).
4. S. Subramanian, G. S. McCarty, and J. Catchmark, "Molecular ruler lithography processes using sacrificial multilayer host structures," J. Microlithogr., Microfabr., Microsyst. 4(4), 049701 (2005).
5. M. J. Madou, Fundamentals of Microfabrication: The Science of Miniaturization, 2nd ed., CRC Press, Boca Raton, FL (2002).
6. S. Subramanian and J. Catchmark, "Manufacturing methods employing molecular ruler lithography," in Proc. 38th Int. Symp. on Micro-electronics (Sep. 2005).
7. S. Subramanian and J. Catchmark, "Molecular ruler lithography process with sacrificial multilayer host structures incorporating a barrier layer," in Proc. AVS 52nd Anna. Int. Symp. (in press).
8. S. Subramanian and J. M. Catchmark, "Molecular ruler lithography processes and their application to sub 50 nm MOS devices," in Proc. 231st ACS National Meeting, on Polymers for Enabling Nanoscale Patterning division (2006).