Refractive index and etched structure of silicon nitride waveguides fabricated by PECVD

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 5004-5007

  Yoon, D H ^a   Yoon, S G ^a   Kim, Y T ^b  

^a Sungkyunkwan University   (South Korea)

^b Samsung SDI   (South Korea)

Author keywords

Optical waveguide; PLC; Refractive index; Silicon nitride

Indexed keywords

ELLIPSOMETRY; ETCHING; OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; VISCOSITY;

ANNEALING TEMPERATURE; FLOW RATIO;

THIN FILMS;

EID: 33947165683     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.059     Document Type: Article

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