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Volumn 256, Issue 1, 2007, Pages 565-570

Production of highly charged ions in the range of energy of 10 V × q up to MeV

Author keywords

EBIT; Highly charged ions; Ion irradiation; Materials modification

Indexed keywords

ION SOURCES; IONIC CONDUCTION; KINETIC ENERGY; KRYPTON; NICKEL; POSITIVE IONS;

EID: 33947136235     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.11.083     Document Type: Article
Times cited : (15)

References (7)
  • 2
    • 33947126738 scopus 로고    scopus 로고
    • http://www.dreebit.com.
  • 3
    • 33947129404 scopus 로고    scopus 로고
    • R.W. Schmieder, R.J. Bastasz, in: VIth International Conference on the Physics of Highly Charged Ions, AIP Conference Proceedings 274, AIP, New York, 1993, p. 675.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.