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Volumn 56, Issue 1, 2007, Pages 371-375
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Microstructures of Al and Cu interconnects
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Author keywords
EBSD; Electromigration; Interconnect; Microstructure
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Indexed keywords
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EID: 33847785033
PISSN: 10003290
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (2)
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References (12)
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