Spin polarization of Co2 MnGe and Co2 MnSi thin films with A2 and L 21 structures

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Rajanikanth, A ^a   Takahashi, Y K ^b   Hono, K ^a,b  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANDREEV REFLECTION TECHNIQUE; SUBSTRATE TEMPERATURES;

COBALT COMPOUNDS; FILM GROWTH; POINT CONTACTS; POLYCRYSTALLINE MATERIALS; SILICON; SPIN POLARIZATION; SPUTTER DEPOSITION;

THIN FILMS;

EID: 33847755507     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2409775     Document Type: Article

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