Current-distance-voltage characteristics of electron tunneling through an electrochemical STM junction

Surface Science

Volumn 601, Issue 6, 2007, Pages 1554-1559

  Woo, D H ^a   Choi, E M ^a   Yoon, Y H ^a   Kim, K J ^a   Jeon, I C ^b   Kang, H ^a  

^a Seoul National University   (South Korea)

^b Chonbuk National University   (South Korea)

Author keywords

Electrochemistry; Electron tunneling; Gold electrode; Scanning tunneling microscopy (STM); Tunneling barrier height

Indexed keywords

ELECTROCHEMISTRY; ELECTRODES; GOLD; MATHEMATICAL MODELS; SCANNING TUNNELING MICROSCOPY;

GOLD ELECTRODES; TUNNELING BARRIER HEIGHT; TUNNELING CURRENT; TUNNELING MODEL;

ELECTRON TUNNELING;

EID: 33847707358     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.01.021     Document Type: Article

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