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Journal of the Physical Society of Japan

Volumn 75, Issue 3, 2006, Pages

Resonant inelastic X-ray scattering of EuNi2(Si1-xGe x)2 and Eu2O3 at Eu L3 absorption edge

(14) Yamaoka, H a Taguchi, M a Vlaicu, A M b Oohashi, H c Yokoi, K c Horiguchi, D c Tochio, T c Ito, Y c Kawatsura, K d Yamamoto, K a,e Chainani, A a Shin, S a Shiga, M c Wada, H f

a RIKEN SPring 8 Center ^* (Japan)

b NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

c KYOTO UNIVERSITY (Japan)

d KYOTO INSTITUTE OF TECHNOLOGY (Japan)

e Osaka Prefecture University (Japan)

f KYUSHU UNIVERSITY (Japan)

Author keywords

Impurity anderson model; Kondo volume collapse; Mixed valence; Partial fluorescence yield; Resonant inelastic x ray scattering

Indexed keywords

EID: 33847691628 PISSN: 00319015 EISSN: 13474073 Source Type: Journal
DOI: 10.1143/JPSJ.75.034702 Document Type: Article

Times cited : (23)

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