Deeply etched SiO2 ridge waveguide for sharp bends

Journal of Lightwave Technology

Volumn 24, Issue 12, 2006, Pages 5019-5024

  Dai, Daoxin ^a   Shi, Yaocheng ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Bending; Deep etching; Ridge waveguide; Silicon oxide

Indexed keywords

ELECTRON TRANSITIONS; ETCHING; FINITE DIFFERENCE METHOD; SILICA;

RIDGE WAVEGUIDE; SHARP BEND;

OPTICAL WAVEGUIDES;

EID: 33847681327     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2006.885243     Document Type: Article

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