Improvement of in-plane anisotropy field in FeCoB/NiFe/Si thin films by Kr sputtering

Journal of Magnetism and Magnetic Materials

Volumn 310, Issue 2 SUPPL. PART 3, 2007, Pages 2636-2637

  Hashimoto, A ^a   Ito, S ^a   Nakagawa, S ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Facing targets sputtering; FeCoB; Magnetic anisotropy field; Perpendicular magnetic recording; Soft magnetic underlayer

Indexed keywords

GLASS; IRON COMPOUNDS; MAGNETIC ANISOTROPY; MAGNETIC PROPERTIES; MAGNETIC RECORDING; NICKEL COMPOUNDS; SPUTTERING;

MAGNETIC ANISOTROPY FIELD; SOFT MAGNETIC CHARACTERISTICS; SOFT MAGNETIC UNDERLAYERS;

THIN FILMS;

EID: 33847678564     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2006.11.185     Document Type: Article

References (3)

1. Litvinov D., Lyberatos A., Wolfson J., Bain J., and Khizroev S. IEEE Trans. Magn. 38 (2002) 1994
2. Ito S., Okamoto T., Kong S.H., and Nakagawa S. J. Magn. Magn. Mater. 287 (2005) 281
3. Prosen R.J., Holmen J.O., and Gran B.E. J. Appl. Phys. 32 (1961) 91S