Submicron-diameter semiconductor pillar microcavities with very high quality factors

Applied Physics Letters

Volumn 90, Issue 9, 2007, Pages

  Lecamp, G ^a   Hugonin, J P ^a   Lalanne, P ^a   Braive, R ^b   Varoutsis, S ^b   Laurent, S ^b   Lematre A ^b   Sagnes, I ^b   Patriarche, G ^b   Robert Philip, I ^b   Abram, I ^b  

^a INSTITUT D'OPTIQUE GRADUATE SCHOOL   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG REFLECTORS; METAL CLADDING; MIRRORS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR MATERIALS;

BRAGG MIRRORS; OXIDE DEPOSIT CLADDING; PILLAR MICROCAVITIES; QUASIPERIODIC VARIATIONS;

MICROFABRICATION;

EID: 33847647946     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2711186     Document Type: Article

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