Microscopic annealing process and its impact on superconductivity in T′-structure electron-doped copper oxides

Nature Materials

Volumn 6, Issue 3, 2007, Pages 224-229

  Kang, Hye Jung ^a,b,c   Dai, Pengcheng ^a,d   Campbell, Branton J ^e   Chupas, Peter J ^f   Rosenkranz, Stephan ^f   Lee, Peter L ^g   Huang, Qingzhen ^b   Li, Shiliang ^a   Komiya, Seiki ^h   Ando, Yoichi ^h  

^a UNIVERSITY OF TENNESSEE   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

^d OAK RIDGE NATIONAL LABORATORY   (United States)

^e Brigham Young University   (United States)

^f ARGONNE NATIONAL LABORATORY   (United States)

^g ARGONNE NATIONAL LABORATORY   (United States)

^h CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHARGE CARRIERS; DOPING (ADDITIVES); ELECTRON SCATTERING; OPTICAL RESOLVING POWER; SUPERCONDUCTIVITY;

CU DEFICIENCIES; LOW-OXYGEN ENVIRONMENT; MICROSCOPIC PROCESSES;

COPPER OXIDES;

EID: 33847631365     PISSN: 14761122     EISSN: 14764660     Source Type: Journal    
DOI: 10.1038/nmat1847     Document Type: Article

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