Tunnel magnetoresistance in magnetic tunnel junctions with Co2Fe (Al, Si) full-Heusler films

Journal of Magnetism and Magnetic Materials

Volumn 310, Issue 2 SUPPL. PART 3, 2007, Pages 1940-1942

  Tezuka, N ^a,b   Ikeda, N ^a   Miyazaki, A ^a   Okamura, S ^a   Kikuchi, M ^c   Sugimoto, S ^a   Inomata, K ^b,d  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c Kojundo Chemical Laboratory Co   (Japan)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Full Heusler; Half metallic ferromagnet; Magnetic tunnel junction; Tunnel magnetoresistance

Indexed keywords

COBALT COMPOUNDS; ELECTRODES; FERROMAGNETIC MATERIALS; MAGNETIC STRUCTURE; TUNNEL JUNCTIONS;

HALF METALLIC FERROMAGNETS; HEUSLER FILMS; MAGNETIC TUNNEL JUNCTIONS; TUNNEL MAGNETORESISTANCE (TMR);

MAGNETORESISTANCE;

EID: 33847626302     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2006.10.812     Document Type: Article

References (8)

1. Livesay E.A., West R.N., Dugdale S.B., Santi G., and Jarlborg T. J. Phys.: Condens. Matter 11 (1999) L279
2. Bowen M., Bibes M., Barthelemy A., Contour J.-P., Anane A., Lemaitre Y., and Fert A. Appl. Phys. Lett. 82 (2003) 233
3. Julliere M. Phys. Lett. 54A (1975) 225
4. Fujii S., Sugimura S., Ishida S., and Asano S. J. Phys.: Condens. Matter 2 (1990) 1118
5. Galanakis I., and Mavropoulos P. Phys. Rev. B 67 (2003) 10253
6. Okamura S., Miyazaki A., Sugimoto S., Tezuka N., and Inomata K. Appl. Phys. Lett. 86 (2005) 232503
7. Sakuraba Y., Nakata J., Oogane M., Ando Y., Kato H., Sakuma A., Miyazaki T., and Kubota H. Appl. Phys. Lett. 88 (2006) 022503
8. Tezuka N., Ikeda N., Miyazaki A., Sugimoto S., Kikuchi M., and Inomata K. Appl. Phys. Lett. 89 (2006) 112514