Scatterometric process monitor for silylation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3050, Issue , 1997, Pages 182-193

  Zaidi, Shoaib H ^a,b   McNeil, John R ^b   Naqvi, S Sohail H ^a  

^a GIK INSTITUTE OF ENGINEERING SCIENCES AND TECHNOLOGY   (Pakistan)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

Diffraction; Process control; Scatterometry; Sensor; Silylation; Surface imaging resists

Indexed keywords

DIFFRACTION; LIGHT; SENSORS; SILANES;

COMPUTATIONAL ANALYSIS; METROLOGY TOOLS; NON-DESTRUCTIVE; PROCESSING CONDITIONS; PROCESSING EFFECTS; SCATTEROMETRY; SILYLATION; SURFACE IMAGING RESISTS; TOP SURFACE IMAGING;

PROCESS CONTROL;

EID: 33847574915     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275915     Document Type: Conference Paper

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