Low-temperature deposition of transparent ZnO films by the ultrasonic-mediated stepwise method

Solar Energy Materials and Solar Cells

Volumn 91, Issue 6, 2007, Pages 467-473

  Gao, Xiang Dong ^a   Li, Xiao Min ^a   Yu, Wei Dong ^a   Li, Lei ^a   Qiu, Ji Jun ^a   Peng, Fang ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

Films; Optical properties; SILAR; Ultrasonic; ZnO

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; EVAPORATION; GRAIN SIZE AND SHAPE; LOW TEMPERATURE EFFECTS; MORPHOLOGY; OPTICAL PROPERTIES; ULTRASONICS; ZINC OXIDE;

HIGH-TEMPERATURE DEPOSITION; PHASE PURITY; SILAR; ULTRASONIC IRRADIATION;

THIN FILMS;

EID: 33847310914     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2006.10.023     Document Type: Article

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