The influence of inorganic oxidants and metal ions on semiconductor sensitized photodegradation of 4-fluorophenol

Chemical Engineering Journal

Volumn 128, Issue 1, 2007, Pages 51-57

  Selvam, K ^a   Muruganandham, M ^a   Muthuvel, I ^a   Swaminathan, M ^a  

^a ANNAMALAI UNIVERSITY   (India)

Author keywords

4 Fluorophenol; Photocatalysis; TiO2 P25; UV A light; ZnO

Indexed keywords

MATHEMATICAL MODELS; PHOTOCATALYSIS; PHOTODEGRADATION; REACTION KINETICS; ULTRAVIOLET RADIATION;

LANGMUIR-HINSHELWOOD MODEL; PHOTOMINERALIZATION;

PHENOLS;

MATHEMATICAL MODELS; PHENOLS; PHOTOCATALYSIS; PHOTODEGRADATION; REACTION KINETICS; ULTRAVIOLET RADIATION;

EID: 33847306911     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2006.07.016     Document Type: Article

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