Modeling material saturation effects in microholographic recording

Optics Express

Volumn 15, Issue 4, 2007, Pages 1732-1737

  Nagy, Zs ^a   Koppa, P ^a   Ujhelyi, F ^a   Dietz, E ^b   Frohmann, S ^b   Orlic, S ^b  

^a BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTIVE OPTICS; HOLOGRAMS; MATHEMATICAL MODELS; PHOTOPOLYMERIZATION;

DIFFRACTION EFFICIENCY; MICROHOLOGRAMS; STORAGE MATERIALS;

OPTICAL RECORDING;

EID: 33847187062     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.001732     Document Type: Article

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