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Volumn 2006 A, Issue , 2006, Pages 289-296

High performance and sub-ambient silicon microchannel cooling

Author keywords

[No Author keywords available]

Indexed keywords

HEAT RESISTANCE; INTAKE SYSTEMS; INTEGRATED CIRCUIT MANUFACTURE; MICROSTRUCTURE; SILICON;

EID: 33846970921     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/icnmm2006-96094     Document Type: Conference Paper
Times cited : (5)

References (11)
  • 1
  • 3
    • 33846942058 scopus 로고    scopus 로고
    • private communication
    • J. Cai and D.J. Frank, private communication.
    • Cai, J.1    Frank, D.J.2
  • 4
    • 0019563707 scopus 로고
    • High Performance Heat Sink for VLSI
    • D.B. Tuckerman and R.F.W. Pease, "High Performance Heat Sink for VLSI", IEEE Electron Dev. Lett., EDL-2, No. 5, pp. 126-129, 1981.
    • (1981) IEEE Electron Dev. Lett , vol.EDL-2 , Issue.5 , pp. 126-129
    • Tuckerman, D.B.1    Pease, R.F.W.2
  • 5
    • 25844500236 scopus 로고    scopus 로고
    • E.G. Colgan, B. Furman, M. Gaynes, W. Graham, N. LaBianca, J. H. Magerlein, R. J. Polastre, M. B. Rothwell, R. J. Bezama, R. Choudhary, K. Marston, H. Toy, J. Wakil, J. Zitz, and R. Schmidt, Practical Implementation of Silicon Microchannel Coolers for High Power Chips, pp. 1-7 of the Proceedings of the 21st Annual IEEE Semiconductor Thermal Measurement and Management Symposium, San Jose CA, March 15-17, 2005.
    • E.G. Colgan, B. Furman, M. Gaynes, W. Graham, N. LaBianca, J. H. Magerlein, R. J. Polastre, M. B. Rothwell, R. J. Bezama, R. Choudhary, K. Marston, H. Toy, J. Wakil, J. Zitz, and R. Schmidt, "Practical Implementation of Silicon Microchannel Coolers for High Power Chips", pp. 1-7 of the Proceedings of the 21st Annual IEEE Semiconductor Thermal Measurement and Management Symposium, San Jose CA, March 15-17, 2005.
  • 6
    • 0037683086 scopus 로고    scopus 로고
    • F. Laermer and A. Urban, Challenges, developments and applications of silicon deep reactive ion etching, Microelectron. Eng. (Netherlands) 67-68, pp. 349-55 and references therein, 2003.
    • F. Laermer and A. Urban, "Challenges, developments and applications of silicon deep reactive ion etching", Microelectron. Eng. (Netherlands) Vol. 67-68, pp. 349-55 and references therein, 2003.
  • 9
    • 0023330725 scopus 로고
    • Cooling characteristics of diamond-shaped interrupted cooling fins for high power LSI devices
    • T. Kishimoto and S. Sasaki, "Cooling characteristics of diamond-shaped interrupted cooling fins for high power LSI devices", Electronic Letters, Vol. 23, No. 9, pp 456-457, 1987.
    • (1987) Electronic Letters , vol.23 , Issue.9 , pp. 456-457
    • Kishimoto, T.1    Sasaki, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.