Simplifying the 45nm SDE process with clusterBoron® and clusterCarbon™ implantation

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 182-185

  Krull, Wade ^a   Haslam, Brian ^a   Horsky, Tom ^a   Verheyden, Kurt ^b,c   Funk, Klaus ^b,c  

^a Ceradyne Inc   (United States)

^b ASM   (Belgium)

^c ASM   (Germany)

Author keywords

Boron diffusion control; Cluster implantation; Molecular implantation

Indexed keywords

EID: 33846950056     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401490     Document Type: Conference Paper

References (5)

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2. N. Hamamoto, et al, IIT2004 Proceedings, Oct. 2004, p443.
3. J.O. Borland, et al, IWJT 2006, p4.
4. D. Adams, et al, IIT2006, June 2006
5. E.J.H. Collart IIT2006, June 2006