Molecular/electronic structure-surface acidity relationships of model-supported tungsten oxide catalysts

Journal of Catalysis

Volumn 246, Issue 2, 2007, Pages 370-381

  Kim, Taejin ^a   Burrows, Andrew ^a   Kiely, Christopher J ^a   Wachs, Israel E ^a  

^a Lehigh University   (United States)

Author keywords

Al2O3; Catalysts; CH3OCH3; CH3OH; Dehydration; HR TEM; Nb2O5; Raman; Spectroscopy; Supported; TiO2; TPSR; UV vis; WO3; ZrO2

Indexed keywords

ACIDITY; CATALYSTS; DEHYDRATION; ELECTRONIC STRUCTURE; IMPREGNATION; MOLECULAR STRUCTURE; RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL); ULTRAVIOLET SPECTROSCOPY;

AMMONIUM METATUNGSTATE; HR-TEM; MONOLAYER COVERAGE; SURFACE ACIDITY; TPSR; TUNGSTEN OXIDE;

TUNGSTEN COMPOUNDS;

EID: 33846939274     PISSN: 00219517     EISSN: 10902694     Source Type: Journal    
DOI: 10.1016/j.jcat.2006.12.018     Document Type: Article

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